The accelerating nanoscale Kirkendall effect in Co films-native oxide Si(100)system induced by high magnetic fields
查看参考文献55篇
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文摘
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The morphology evolution and magnetic properties of Co films-native oxide Si(100)were investigated at 873,973,and 1073K in a high magnetic field of 11.5 T.Formation of Kirkendall voids in the Co films was found to cause morphology evolution due to the difference in diffusion flux of Co and Si atoms through the native oxide layer.The high magnetic fields had considerable effect on the morphology evolution by accelerating nanoscale Kirkendall effect.The diffusion mechanism in the presence of high magnetic fields was given to explain the increase of diffusion coefficient.The morphology evolution of Co films on native oxide Si(100)under high magnetic fields during annealing resulted in the magnetic properties variation. |
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来源
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Journal of Materials Science & Technology
,2020,46:127-135 【核心库】
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DOI
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10.1016/j.jmst.2019.11.038
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关键词
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Thin films
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Annealing
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Diffusion
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Kirkendall effect
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High magnetic field
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地址
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1.
Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen, 518060
2.
Northeastern University, Key Laboratory of Electromagnetic Processing of Materials(Ministry of Education), Shenyang, 110819
3.
Department of New Energy Science and Engineering, School of Metallurgy, Northeastern University, Shenyang, 110819
4.
Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016
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语种
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英文 |
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文献类型
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研究性论文 |
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ISSN
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1005-0302 |
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学科
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金属学与金属工艺 |
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基金
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国家自然科学基金
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Liaoning Innovative Research Team in University
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the Fundamental Research Funds for the Central Universities
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文献收藏号
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CSCD:6758255
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参考文献 共
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