异质界面调控超薄PbTiO_3薄膜四方性的研究
Study of tetragonality in ultrathin PbTiO_3 films driven by heterointerface
查看参考文献14篇
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文摘
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本文利用球差校正透射电子显微镜研究了异质界面结构对PbTiO_3 /La_(0.7)Sr_(0.3)MnO_3 /NdGaO_3 ( 110) O以及PbTiO_3 /NdGaO_3 ( 110) O超薄薄膜体系中铁电PbTiO_3层四方性的影响。结果表明,在NdGaO_3 ( 110) O衬底上生长的具有化学价态不连续异质界面( La_(0.7)Sr_(0.3)MnO_3 /PbTiO_3 )的PbTiO_3薄膜体系中四方性比直接在NdGaO_3 ( 110) O衬底上生长超薄PbTiO_3薄膜的四方性明显增强,XPS谱分析显示出界面Mn元素价态发生了变价,探讨了界面处化学价态的变化对薄膜四方性的影响。 |
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其他语种文摘
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Aberration-corrected scanning transmission electron microscopy was applied to investigate two different film systems. It is found that when ultrathin PbTiO_3 films grow on the NdGaO_3 substrate buffered with La_(0.7) Sr_(0.3) MnO_3 electrode,the tetragonality is improved compared with PbTiO_3 films grown on NdGaO_3 substrates directly. It is owing to the accumulation of oxygen vacancies at the heterointerface between La_(0.7)Sr_(0.3)MnO_3 and PbTiO_3,induced by charge transfer of Mn valence reduction as evidenced by XPS analysis. The results may facilitate the development of nanoscale ferroelectric materials. |
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来源
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电子显微学报
,2018,37(4):321-325 【扩展库】
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DOI
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10.3969/j.issn.1000-6281.2018.04.004
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关键词
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铁电薄膜
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异质界面
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四方性提高
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球差校正透射电子显微镜
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地址
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中国科学院金属研究所, 沈阳材料科学国家(联合)实验室, 辽宁, 沈阳, 110016
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中国科学院大学, 北京, 100049
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语种
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中文 |
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文献类型
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研究性论文 |
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ISSN
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1000-6281 |
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学科
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晶体学;一般工业技术;金属学与金属工艺 |
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基金
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国家自然科学基金
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国家科学院前沿局重点研究项目
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文献收藏号
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CSCD:6306454
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