氮气分压对电弧离子镀CrNx薄膜组织结构的影响
Nitrogen Partial Pressure and Microstructures of CrNx Coating by Arc Ion Plating
查看参考文献13篇
文摘
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利用电弧离子镀技术在钛合金表面制备CrN_x薄膜,分析讨论氮气分压对薄膜表面形貌、相组成和微观结构的影响. 结果表明,随着氮气分压的升高, CrN_x薄膜表面熔滴的数量及尺寸减少,表面平整度得到明显改善;薄膜的物相组成在氮气分压为1.0 Pa时由Cr_2N相变为CrN相;同时因氮气分压改变粒子、离子的轰击作用,影响薄膜表面的能量状态, CrN_x薄膜晶体的择优生长由(200),(220)变为(111). 在氮气分压为1.5 Pa时可获得高沉积效率、高致密度、高硬度,并具有纳米晶体结构的单相CrN薄膜 |
其他语种文摘
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The CrNxcoatings were deposited by arc ion plating onTi-6Al-4V substrates. The impacts of the coating conditions, including the nitrogen partial pressure, deposition rate, duty cycle of the voltage pulse,on mechanical properties of the coating were evaluated. The microstructures of the coating were characterized with scanning electron microscopy,X-ray diffraction, and transmission electronmicroscopy. The results showthatthe nitrogen partial pressure significantly affects the surface morphologies, microstructures and mechanical properties of the CrN_xcoatings. For example,as the partial pressure rises up, the coating becomes increasingly smoothwith decreased number and sizes of Cr droplets. At a 1.0 Pa of nitrogen, the Cr_2N phase transited into CrN. Moreover, the partial pressure influenced the bombardment of charged particles and the electronic properties of the surface. At 1.5 Pa, CrN and a high deposition rate, highly compact, nanocrystal CrN films with high surface hardness can be grown |
来源
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真空科学与技术学报
,2010,30(6):662-666 【扩展库】
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关键词
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电弧离子镀
;
CrN_x薄膜
;
氮气分压
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组织结构
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地址
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1.
江苏大学材料科学与工程学院, 镇江, 212013
2.
中国科学院金属研究所材料表面工程研究部, 沈阳, 110016
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语种
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中文 |
文献类型
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研究性论文 |
ISSN
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1672-7126 |
学科
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一般工业技术 |
基金
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江苏大学高级技术人才科研启动基金项目
;
江苏大学科技创新团队资助课题
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文献收藏号
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CSCD:4052569
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