文摘
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甘草种子注入25 keV,剂量≤4.68×1016 个/cm2 N+对种子萌发的成活率和根发育表现为刺激效应,更高剂量的N+注入表现出"损伤-修复-损伤"的效应趋势,表明离子注入的能量沉积和动量传递效应产生的自由基伤害与质量沉积和电荷的中和效应对自由基的清除是一个动态反应过程.25 keV,4.68×1016 个/cm2 N+注入能提高甘草种子萌发成活率,促进根发育,提高幼苗的耐旱特性,可用于沙漠植被甘草种子的前处理. |
其他语种文摘
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25 keV, dosage ≤4. 68 * 10~(16)/cm~2 N~+ implantation showed stimulation effects on seed germination and root development in Glycyrrhiza uralensis. N~+ of higher influence showed a trend of "damage-repair-damage model". It was suggested there was a dynamic of elimination of free radical caused by energy deposition, momentum transfer and charge neutralization in the process of implantation. 25 keV, 4. 68 * 10~(16)/cm~2 N~+ implantation was also the appropriate mutagen for improving the surviving rate, germination, root development and seedling drought tolerance. It, therefore, could be applicated to treatment of the plant seeds for vegetation in desert lands. |
来源
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草业学报
,2004,13(5):112-115 【核心库】
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关键词
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离子注入
;
甘草
;
种子萌发
;
根发育
;
耐旱特性
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地址
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1.
安徽农业大学, 安徽, 合肥, 230036
2.
中国科学院等离子体物理研究所, 中科院离子束生物工程学重点实验室, 安徽, 合肥, 230031
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语种
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中文 |
文献类型
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研究性论文 |
ISSN
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1004-5759 |
学科
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农学(农艺学);农作物 |
基金
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国家863计划
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文献收藏号
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CSCD:1616963
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