电弧离子镀沉积Cr-O-N活性扩散阻挡层
Cr-O-N FILMS DEPOSITED BY ARC ION PLATING AS ACTIVE DIFFUSION BARRIERS
查看参考文献12篇
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文摘
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采用电弧离子镀技术在NiCoCrAlY涂层与高温合金基材DSM11间沉积不同成分的Cr-O-N薄膜作为扩散阻挡层,研究了900℃下氧化1400 h后DSM11/Cr-O-N/NiCoCrAlY体系中Cr-O-N层阻挡合金元素互扩散的行为以及阻挡层对涂层氧化动力学曲线的影响.结果表明,Cr-O-N层在高温氧化过程中生成与涂层和基材有良好结合的富Al氧化物层,可以阻挡DSMll基体与NiCoCrAlY涂层间的元素互扩散,起到活性阻挡层的作用;Cr-O-N层中O和N含量影响生成富Al氧化物层的连续性和致密性,从而影响其阻挡元素互扩散的性能.几种成分的Cr-O-N活性扩散阻挡层对NiCoCrAlY涂层900℃下的高温氧化性能都有一定的改善作用,改善程度与阻挡层阻挡合金元素互扩散的程度保持一致. |
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其他语种文摘
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Cr-O-N films with different chemical composition were deposited using arc ion plat-ing (AIP) between NiCoCrAlY coatings and the DSMll substrate as diffusion barriers. The inhi-bition effects of the diffusion barriers on the interdiffusion of the alloy elements in the DSMll/Cr-O-N/NiCoCrAlY system were studied after exposured at 900 °C for 1400 h. The influences of the barriers on the oxidation kinetics were also investigated. The results indicate that the Cr-O-N layers can change into Al-rich oxide layers with active bonding with the coatings and the substrates during the high temperature exposure. The Al-rich oxide layers hindered the interdiffusion of the alloying elements between DSMll substrate and NiCoCrAlY coating. Thus the Cr-O-N layers can act as active diffusion barrier. The O and N compositions in the Cr-O-N layer affect the continuity and density of the Al-rich oxide layers, and influence the inhibition effect of the diffusion barriers accordingly. All the Cr-O-N barriers decreased the weight gain of the NiCoCrAlY coatings at 900 °C. The improvement extent of the Cr-O-N barriers on the oxidation behavior of the NiCoCrAlY coatings is corresponding with the inhibition capacity of the barriers. |
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来源
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金属学报
,2004,40(12):1264-1268 【核心库】
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关键词
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Cr-O-N
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活性扩散阻挡层
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电弧离子镀
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地址
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中国科学院金属研究所, 金属腐蚀与防护国家重点实验室, 沈阳, 110016
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语种
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中文 |
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文献类型
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研究性论文 |
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ISSN
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0412-1961 |
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学科
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金属学与金属工艺 |
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基金
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中国科学院知识创新工程重要方向项目
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文献收藏号
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CSCD:1797718
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