缺陷对坡莫合金薄膜磁畴翻转钉扎影响的洛伦兹透射电镜显微研究
Pinning influence of defects on the magnetic domain reversal in a permally film investigated by a Lorentz TEM
查看参考文献19篇
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文摘
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利用磁控溅射法,在具有孔洞缺陷的铜网碳膜上成功地溅射了一层厚度100 nm,具有圆形缺陷的坡莫合金薄膜。结合常规透射电镜分析测试,研究了此类缺陷的形成机理及结构性质。利用洛伦兹透射电镜观察缺陷对周围磁矩的影响,以及在磁化反转过程中,缺陷对畴壁运动的影响。结果表明,此类缺陷是不同于膜本身的第二相弱磁性材料,它对畴壁的运动有着先排斥后吸引的钉扎作用。 |
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其他语种文摘
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A permalloy film with approximate 100nm thickness was sputtered on a holey carbon coated copper grid using a magnetron sputtering technology.The morphological,crystal structural,and chemical properties of the permalloy film and its defects inside were systematically characterized.A formation mechanism of the defects introduced into the permalloy film was proposed.A Lorentz TEM was used to observe the influence of these defects on the distribution of magnetic moments,and on the dynamical motion of domain wall of the permalloy film during the magnetic reversal.The experimental results reveal that the introduced defects appear a pinning effect of repulsing the motion of magnetic domain wall in the initial stage of magnetic reversal process and then change into an attraction in the rest of reversal process. |
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来源
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电子显微学报
,2012,31(4):294-300 【核心库】
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关键词
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洛伦兹透射电子显微镜
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坡莫合金
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缺陷
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磁矩翻转
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钉扎
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畴壁运动
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地址
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兰州大学, 磁学与磁性材料教育部重点实验室, 甘肃, 兰州, 730000
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语种
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中文 |
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ISSN
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1000-6281 |
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学科
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物理学;金属学与金属工艺;电工技术 |
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基金
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国家重大科学研究计划资助
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甘肃省自然科学基金
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中央高校基本科研业务费
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国家自然科学基金资助项目
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文献收藏号
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CSCD:4673278
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参考文献 共
19
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