含氟水溶液中电化学刻蚀氟化WO_3薄膜电极增强可见光光电化学性能
Enhanced Photoelectrochemical Performance of WO_3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
查看参考文献15篇
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文摘
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报道了在含氟的酸性水溶液中,对电沉积制备的WO_3薄膜电极进行电化学刻蚀,并采用光电化学、扫描电子显微镜(SEM)、X射线衍射(XRD)、光电子能谱(XPS)、紫外-可见漫反射光谱、光致发光(PL)等方法对电极进行了表征.结果表明,刻蚀使电极比表面积增大,质量减少,重要的是可使电极表面状态发生变化.在相同催化剂质量和比表面积的条件下,这种变化显著提高了WO_3薄膜电极在可见光和紫外-可见光照下的光电转换性能.机理研究表明,电极光电化学性能提高可归因于刻蚀使电极表面发生氟化,光生载流子表面复合中心数目减少,平带电位负移.刻蚀对电极的吸光性质和晶体结构等未检测出明显变化.氟化电极在酸性中具有良好的光电化学稳定性. |
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其他语种文摘
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A new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO_3 thin films is presented. The samples were characterized by photoelectrochemistry, scanning electron microscopy(SEAM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV-Vis diffuse reflectance spectroscopy, and photoluminescence (PL). Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes. This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area. This enhancement can be ascribed to the surface fluorination of the electrodes, which result in a decrease in the surface recombination centers and a negative shift in the flatband potential. The light absorption and crystalline were found to be unchanged by etching. The etched WO_3 film electrode shows excellent photoelectrochemical stability in acid solutions. This provides a novel method for increasing the photon electric conversion efficiency of WO_3 thin film electodes. |
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来源
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物理化学学报
,2009,25(12):2427-2432 【核心库】
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DOI
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10.3866/pku.whxb20091210
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关键词
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WO_3
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电化学刻蚀
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氟化
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光电化学
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可见光
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地址
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1.
浙江大学玉泉校区化学系, 浙江, 杭州, 310027
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浙江师范大学物理化学研究所, 浙江, 金华, 321004
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语种
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中文 |
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文献类型
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研究性论文 |
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ISSN
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1000-6818 |
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学科
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化学 |
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基金
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国家自然科学基金
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文献收藏号
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CSCD:3777719
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