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中频磁控溅射沉积含铝类金刚石碳膜结构及其摩擦磨损性能研究
Structure and Tribological Properties of Al-DLC Films Prepared by Medium Frequency Magnetron Sputtering

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张广安 1   王鹏 1   陈友明 1   王霞 1   闫鹏勋 2   张俊彦 1  
文摘 采用中频磁控溅射技术在单晶硅表面制备含铝类金刚石(Al-DLC)薄膜,利用原子力显微镜、X射线光电子能谱仪、红外光谱仪、纳米压痕仪和微摩擦磨损试验机等考察薄膜表面形貌、结构及其摩擦磨损性能.结果表明:所制备的Al-DLC薄膜均匀、致密,表面粗糙度小,应力较低,硬度较高;薄膜与Si_3N_4陶瓷球对摩时显示出良好抗磨减摩性能;加基底偏压所制备薄膜的摩擦系数明显降低, 耐磨寿命显著提高.
其他语种文摘 Al containing diamond-like carbon(Al-DLC) thin films were deposited on Si substrate by medium frequency magnetron sputtering.The microstructure,morphology and mechanical properties of the Al-DLC films were investigated by means of X-ray photoelectron spectroscopy,infrared spectrometry,atomic force microscopy and nano-indentation test.The tribological property of the Al-DLC films was studied on a micro ball on disk tester.The friction and wear behavior of the Al-DLC films sliding against Si_3N_4 ceramic ball was evaluated on a ball-on-disk tribometer.The morphologies of the wear scar of the films were observed on a scanning electron microscope.The film had typical diamond-like characteristics and the film surface was very smooth and compact.The hardness of the films was relatively high while the stress was low.It exhibited good friction-reducing and anti-wear behavior as sliding against a Si_3N_4 ball.The films prepared at-1 600 V pulse bias exhibited even lower fiction coefficient and much longer wear life compared to the films prepared at-1 600 V pulse bias.
来源 摩擦学学报 ,2008,28(2):118-122 【核心库】
关键词 中频磁控溅射 ; Al-DLC薄膜 ; 摩擦磨损性能
地址

1. 中国科学院兰州化学物理研究所, 固体润滑国家重点实验室, 甘肃, 兰州, 730000  

2. 兰州大学,等离子体与金属材料研究所, 甘肃, 兰州, 730000

语种 中文
文献类型 研究性论文
ISSN 1004-0595
学科 金属学与金属工艺;机械、仪表工业
基金 国家自然科学基金 ;  中国科学院“百人计划”项目
文献收藏号 CSCD:3245743

参考文献 共 18 共1页

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引证文献 11

1 刘翊 硅掺杂类金刚石薄膜微米尺度摩擦性能研究 功能材料,2010,41(5):759-762
被引 0 次

2 罗建军 等离子体基离子注入沉积DLC膜的划擦行为 金属热处理,2010,35(8):27-30
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