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SiON对Si基SiO_2 AWG偏振补偿的数值分析
Numerical Analysis for Polarization Compensation of Silica on Silica AWG Using SiON
查看参考文献10篇
文摘
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采用全矢量交替方向隐含迭代方法系统分析了高折射率SiON薄膜对Si基SiO2阵列波导光栅中波导应力双折射的影响.分析结果表明在芯区上或下表面沉积SiON薄膜可以明显减小Si基SiO2阵列波导光栅(AWG)中波导的应力双折射,但这两种补偿方法容易使模场偏移中心位置,不利于波导与光纤的耦合.理想的补偿方法是在芯区上下同时补偿,可减小模场偏移,并用该方法设计了偏振无关的16通道AWG. |
其他语种文摘
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The influence of high refraction index SiON film on stress birefringence of waveguide in silica on silicon arrayed waveguide grating (AWG) is analyzed systematically using full-vector alternating direction implicit (ADD iterative method. The result shows that the stress birefringence of the waveguide in silica on silicon AWG can be improved by depositing SiON film above or below the waveguide,but the position of the mode profile will deflect the centre of the waveguide in this condition. The deflection can be improved by depositing the SiON film both above and below the waveguide. A polarization independent 16 channels AWG is theoretically designed using this method. |
来源
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半导体学报
,2004,25(7):858-862 【核心库】
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关键词
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SiON薄膜
;
Si基SiO_2波导
;
应力
;
双折射
;
阵列波导光栅
;
偏振补偿
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地址
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中国科学院半导体研究所光电子研究发展中心, 北京, 100083
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语种
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中文 |
文献类型
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研究性论文 |
ISSN
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0253-4177 |
学科
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电子技术、通信技术 |
基金
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国家973计划
;
国家自然科学基金
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文献收藏号
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CSCD:1691486
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