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Nd:YAG脉冲激光诱导化学沉积银
Pulsed Nd: YAG Laser Induced Chemical Deposition of Ag
查看参考文献10篇
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文摘
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Nd:YAG脉冲激光扫描照射单晶Si基底表面AgNO_3薄膜，薄膜热分解产生的Ag沉积在Si基底表面形成沉积线。在激光功率为2.8W，频率为35Hz时，最高扫描速度为9mm/s。SEM显示Ag颗粒均匀镶嵌在基底沉积线表面，AES研究沉积线表面元素随深度分布情况，以Ag颗粒为催化中心，在沉积线表面选区化学镀铜，超声振动显示镀铜膜与基底有良好的结合力。简单分析了沉积线表面Ag颗粒形状及表面凹坑出现的原因。 |
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其他语种文摘
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Pulsed Nd: YAG laser was used to irradiate AgNO_3 film on Si substrate, AgNO_3 pyrolyzed by laser energy gives out Ag particles. The particles deposit on Si substrate and form Ag deposited line. The top scanning speed is 9 mm/s when the laser average power equals 2.8 W and the laser frequency equals 35 Hz. SEM shows that Ag particles are evenly inlaid along the deposited lines on Si substrate. AES analyzed the elements distribution with depth on the surfaces of deposited lines. Selectedarea electroless plating of copper was obtained on Ag deposited lines. The copper film exhibits good adhesion to Si substrate after long time ultrasonic vibration. The formation mechanics of sphere-shaped Ag particles and dent areas on the irradiated lines were also simply discussed. |
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来源
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东北大学学报. 自然科学版
,2002,23(4):391-393 【核心库】
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关键词
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Nd:YAG脉冲激光
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激光诱导化学沉积
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选区化学镀
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Si基底
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地址
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1.
东北大学理学院, 辽宁, 沈阳, 110004
2.
中国科学院金属研究所, 辽宁, 沈阳, 110016
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语种
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中文 |
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文献类型
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研究性论文 |
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ISSN
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1005-3026 |
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学科
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电子技术、通信技术 |
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基金
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国家973计划
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文献收藏号
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CSCD:982053
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10
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