新型光刻技术研究进展
Recent progress of novel photolithography technologies
查看参考文献44篇
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文摘
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集成电路光刻作为传统光刻技术的典型代表,支撑着集成电路芯片的快速发展。新一代光刻技术具有工艺多样化、光刻精度高、光刻效率高的优点,在研发新型光电子器件、实现3维微纳结构、构建有序纳米孔通道等方面有很大的潜力。回顾了近些年来涌现的多种新型光刻技术,分析了各自的特征及在新型纳米电子、光子器件、能源、传感等领域中的应用。对未来光刻技术的发展方向进行了展望。 |
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其他语种文摘
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Integrated circuit(IC) lithography,as a typical representative of traditional lithography technology,supports the rapid development of integrated circuit chips. The new generation of photolithography technology has the advantages of diverse technology,high precision and high efficiency. It has great potential in the development of optoelectronic devices,the realization of 3-D micro-nano structure,and the construction of the ordered nanoscale channels. A variety of new photolithography technologies in recent years have been reviewed. Their characteristics and their applications in nanoelectronics,photonic devices, energy,sensing and other fields have been analyzed. Finally,the development direction of lithography technology in the future is prospected. |
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来源
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激光技术
,2019,43(1):30-37 【扩展库】
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DOI
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10.7510/jgjs.issn.1001-3806.2019.01.007
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关键词
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激光技术
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光学制造
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新型光刻技术
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无掩模光刻
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掩模光刻
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微纳结构
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地址
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1.
合肥工业大学电子科学与应用物理学院, 合肥, 230009
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中国科学院安徽光学精密机械研究所, 合肥, 230031
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语种
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中文 |
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文献类型
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综述型 |
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ISSN
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1001-3806 |
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学科
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电子技术、通信技术 |
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文献收藏号
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CSCD:6410174
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