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Study of the Characteristics of DC and ICP Hybrid Discharge Plasmas

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Wang Zhan 1   Gao Wei 1   Zhang Peng 1   Yan Huijie 2   Ren Chunsheng 2 *  
文摘 In this paper, the double-discharge plasma generated by radio frequency (RF) and direct current (DC) has been investigated. In comparison with their single-frequency counterpart, the interaction between the two excitations is significant and beneficial. The results show that the RF discharge can effectively increase the DC discharge current and decrease the DC voltage; meanwhile the DC discharge is favorable to feed abundant high energy seed electrons to the ICP discharge sustaining at 13.56 MHz for the latter to acquire higher plasma density and lower plasma potential by increasing the ionization rate. The innovative design has been demonstrated to facilitate more homogeneous performance with higher plasma density.
来源 Plasma Science & Technology ,2015,17(3):191-195 【核心库】
DOI 10.1088/1009-0630/17/3/04
关键词 ICP ; DC discharge ; Langmuir probe ; plasma characteristic
地址

1. AVIC Shenyang Aircraft Design & Research Institute, Shenyang, 110035  

2. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, 116024

语种 英文
文献类型 研究性论文
ISSN 1009-0630
学科 原子能技术
基金 国家自然科学基金
文献收藏号 CSCD:5372062

参考文献 共 15 共1页

1.  Manos D M. Plasma Etching: An Introduction,1989 CSCD被引 5 次    
2.  Auciello O. Plasma-Surface Interactions and Processing of Materials,1990 CSCD被引 2 次    
3.  Lieberman M A. Principles of Plasma Discharges and Materials Processing,1994 CSCD被引 43 次    
4.  Hopwood J. Plasma Sources Sci. Technol,1992,1:109 CSCD被引 22 次    
5.  Keller J H. Plasma Sources Sci. Technol,1996,5:166 CSCD被引 4 次    
6.  Xu S. AIP Conf. Proc., 669,2003:44 CSCD被引 1 次    
7.  Miyake S. Vacuum,2000,59:472 CSCD被引 1 次    
8.  Jun H S. Appl. Phys. Lett,2008,92:041501 CSCD被引 3 次    
9.  Chen Francis F. Physics of Plasmas,2001,8:3008 CSCD被引 1 次    
10.  Nakagawa H. J. Vac. Sci. Technol. A,1999,17:1514 CSCD被引 4 次    
11.  Laframboise J G. Report No 100. Institute for Aerospace studies,1996 CSCD被引 1 次    
12.  Lieberman M A. Principles of Plasma Discharges and Materials Processing,2005:189, 690 CSCD被引 1 次    
13.  Dickson M. J. Vac. Sci. Technol. A,1997,15:340 CSCD被引 1 次    
14.  Hopkins M B. Rev. Sci. Instrum,1986,57:2210 CSCD被引 7 次    
15.  Elghazaly M H. Journal of Quantitative Spectroscopy and Radiative Transfer,2006,97:58 CSCD被引 1 次    
引证文献 2 篇

1 Hua Yue Effects of direct current discharge on the spatial distribution of cylindrical inductively-coupled plasma at different gas pressures Plasma Science & Technology,2018,20(1):014005-1-014005-9
CSCD被引 1 次

2 Hua Yue Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source Plasma Science & Technology,2018,20(6):065402-1-065402-8
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