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高重复频率ArF准分子激光器能量控制算法研究
Study on energy control algorithm for high-repetition-rate ArF excimer lasers

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文摘 为了实现工业用高重复频率ArF准分子激光器脉冲能量稳定,从电源控制的角度进行了脉冲能量控制技术的基础研究。介绍了高重复频率ArF准分子激光器能量稳定闭环控制原理,使用近似方法建立了准分子激光器脉冲能量和放电电压的函数模型,提出一种基于实时检测脉冲能量的电压调节比例积分算法,并结合函数模型和控制算法进行了MATLAB仿真。结果表明,建立的脉冲能量模型是合理的,且提出的比例积分算法在提高激光器脉冲输出能量稳定性方面是有效的。
其他语种文摘 In order to achieve the pulse energy stability of high-repetition-rate ArF excimer lasers, the technology of pulse energy control was studied from the perspective of power supply adjustment. The closed-loop control principle for pulse energy stability of high-repetition-rate ArF excimer lasers was introduced. The function model between the output energy of excimer laser and the discharge voltage was established with approximation method, and the proportion-integration(PI) algorithm for real-time adjustment of discharge voltage based on the real-time detection of pulse energy was proposed. Combined with the function model and the control algorithm, simulation was carried out with MATLAB software. The simulation results indicate that the pulse energy model is reasonable and the PI algorithm is feasible for improving the laser pulse energy stability.
来源 激光技术 ,2012,36(6):763-766 【核心库】
关键词 激光器 ; 能量稳定 ; 比例积分算法 ; 高重复频率 ; ArF准分子激光器
地址

中国科学院安徽光学精密机械研究所, 合肥, 230031

语种 中文
ISSN 1001-3806
学科 电子技术、通信技术;自动化技术、计算机技术
文献收藏号 CSCD:4666844

参考文献 共 14 共1页

1.  Saito T. Ultra line-narrowed ArF excimer laser G42A for sub-90nm lithography. Proceedings of SPIE. 5040,2003:1704-1711 被引 1    
2.  Miao X Q. Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond. Proceedings of SPIE. 6924,2008:69240A/1-69240A/8 被引 1    
3.  Saito T. Ultra-narrow bandwidth 4kHz ArF excimer laser for 193nm lithography. Proceedings of SPIE. 4346,2001:1229-1237 被引 1    
4.  Kumazaki T. Reliable high power injection locked 6kHz 60W laser for ArF immersion lithography. Proceedings of SPIE. 6924,2008:2R1-2R10 被引 1    
5.  Kakizaki K. High-repetition-rate(6kHz)and long-pulse-duration (50ns) ArF excimer laser for sub-65nm lithography. Review of Scientific Instruments,2006,77(3):035109-1-035109-6 被引 9    
6.  Basting D. Excimer laser technology:laser sources, optics, systems and applications. Gottingen,2001:56-57,256-257 被引 1    
7.  Liang X. Excimer gas charging system based on microprocessor. Laser Journal,2010,31(1):32-33 被引 3    
8.  Liang X. Excimer pulse energy stabilization realized by charging voltage real-time adjusting. (in Chinese). Chinese Jourmal of Lasers,2010,37(2):374-378 被引 1    
9.  You L B. Design and experimental study of all solid state pulse power module for excimer laser. (in Chinese). High Power Laser and Particle Beams,2009,21(11):1750-1754 被引 6    
10.  Pflanz T. Compact excimer laser light source for optical (mask) inspection systems. Proceedings of SPIE. 4349,2001:180-184 被引 3    
11.  Delmdahl R F. Solid-state pulsed high-repetition rate excimer lasers. Proceedings of SPIE. 5339,2004:284-291 被引 2    
12.  Brown D J W. XLR500i: recirculating ring ArF light source for immersion lithography. Proceedings of SPIE. 6520,2007:652020 被引 2    
13.  Fleurov V. XLR 600i: recirculating ring ArF light source for double patterning immersion lithography. Proceedings of SPIE. 6924,2008:1R1-1R5 被引 1    
14.  Yoshino M. High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography. Proceedings of SPIE. 6924,2008:2S1-2S10 被引 1    
引证文献 4

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