纯Ni及其溅射纳米晶的高温氧化行为
High temperature oxidation behavior of purb Ni and its sputtered nanocrystalline coating
查看参考文献20篇
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文摘
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用磁控溅射方法在电解纯Ni上溅射了一层与其成分相同的纳米晶涂层。研究了纯Ni及其溅射纳米晶涂层在700 ℃～900 ℃的氧化行为。结果表明：在同一温度下，纳米晶纯Ni的氧化增重高于纯Ni，即经溅射纳米化纯Ni的氧化速率变快。利用扫描隧道显微镜、带能谱的扫描电镜和X射线衍射对样品的表面和截面进行了分析，并讨论了其氧化机理。 |
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其他语种文摘
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A nanocrystalline coating with the same composition as pure Ni was deposited on the pure Ni substrate by means of magnetron sputtering. The oxidation behavior of pure Ni and its sputtered nanocrystalline coating in air at 700"C -900°C was studied. The samples were examined by scanning tunnel microscopy(STM), scanning electron microscopy(SEM)with energy dispersive X- ray(EDX)and X- ray diffraction(XRD) .The results indi-cated that the mass gain of the nanocrystalline pure Ni was higher than that of normal grain - sized pure Ni at the same temperature. Nanocrystallization accelerated the oxidation of pure Ni, especially at the very early stage. It is proposed that nanocrystallization may also lead to an increase of oxidation rate at the very early stage for oxi-dation of any multi - element alloy, and it is by this mechanism that nanocrystallization promotes the selective oxidation of alloys. |
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来源
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中国腐蚀与防护学报
,2003,23(6):335-339 【核心库】
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关键词
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纯Ni
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溅射
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纳米晶
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氧化
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地址
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中国科学院金属研究所, 金属腐蚀与防护国家重点实验室, 沈阳, 110016
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语种
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中文 |
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文献类型
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研究性论文 |
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ISSN
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1005-4537 |
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学科
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金属学与金属工艺 |
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基金
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国家自然科学基金国家杰出青年科学基金
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国家自然科学基金
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中国科学院“百人计划”项目
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文献收藏号
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CSCD:1213151
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