|
电弧离子镀Ti(C_xN_(1-x))薄膜的结构和力学性能研究
Structure and Mechanical Properties of Ti(C_xN_(1-x)) Electric Arc Ion Plating
查看参考文献6篇
文摘
|
利用电弧离子镀设备,沉积了不同C、N比的Ti(C_xN_(1-x))薄膜,研究了C含量对Ti(C_xN_(1-x))薄膜的结构(相结构、择优取向及晶格常数)及力学性能(硬度、膜基结合强度及抗磨损性能)的影响。结果表明,复合镀层的C、N比随(CH_4、H_2流量之比而变化,但原子百分数之和基本不变(约46.5%)。复合镀层结构致密,与基体结合良好,抗磨和切削性能优于TiC和TiN镀层。 |
其他语种文摘
|
Ti(C_xN_(1-x)) plating with different ratio of C and N was deposited by using electric are ion plating apparatus. The effect of C content on the structure and mechanical properties of Ti(C_xN_(1-x)) coating was studied. Results showed that antiwear and cutting characteristic of composite coating was more excellent than TiC and TiN coating. |
来源
|
材料保护
,2002,35(12):10-12 【扩展库】
|
关键词
|
离子镀
;
电弧
;
Ti(C_xN_(1-x))薄膜
|
地址
|
1.
中科院金属研究所, 腐蚀与防护国家重点实验室, 辽宁, 沈阳, 110016
2.
中科院金属研究所表面工程重点实验室, 辽宁, 沈阳, 110016
|
语种
|
中文 |
文献类型
|
研究性论文 |
ISSN
|
1001-1560 |
学科
|
金属学与金属工艺 |
文献收藏号
|
CSCD:1030085
|
参考文献 共
6
共1页
|
1.
Guu Y Y. The tribological characteristics of titanium nitride, titanium carbonitride and titanium carbide coatings.
The Solid Films,1997,302:193-200
|
CSCD被引
3
次
|
|
|
|
2.
Larlsson L. Growth, microstructure and mechanical propeties of arc evaporated TiC_xN_(1-x) films.
Surface and coatings Technology,2000,126:1-14
|
CSCD被引
2
次
|
|
|
|
3.
Gabriel H M. Morphology and structure of ion-plated TiN, TiC and Ti(C,N)coatings.
Thin Solid Films,1984,118:243-254
|
CSCD被引
2
次
|
|
|
|
4.
Quaeyaegens C. Experimental study of the growth evolution from random-towards a (111) preferential orientation of PVD TiN coatings.
Thin Solid Films,1995,258:170-173
|
CSCD被引
2
次
|
|
|
|
5.
Schneider J M. X-Ray diffraction investigations of magnetron sputtered TiCN coatings.
Surface Coatings and Technology,1995(74/75):312
|
CSCD被引
1
次
|
|
|
|
6.
Quaeyhaens C. Experimental study of the growth evolution from random towards a (111) preferential orientation of PVD TiN coatings.
Thin Solid Films,1995,258:23
|
CSCD被引
1
次
|
|
|
|
|
|